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News

17.02.2012 | JSC Sitronics announces the opening of production line with 90nm technology at JSC Mikron, Head Company of its business division Sitronics Microelectronics. •••

12.01.2012 | JSC Mikron has begun supplies of ski passes with chip for the biggest facilities of the forthcoming Olympic games 2014  •••

15.11.2011 | Cryptography Research and Mikron JSC sign patent license agreement for DPA countermeasures •••

Video

26.11.2010 | Russia Today. Technology Update's Nano-November. JSC Mikron •••

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Research Institute for Precise Mechanical Engineering

The institute was established in 1962 as a leading enterprise of electronic industry for creation of specific process equipment for microelectronic production. Several thousand equipment items manufactured using the institute’s designs were the basis of semiconductor production in the USSR and later in Russia. The institute’s designs received 121 medal and 4 diplomas at many exhibitions (including international), over 600 patents and certificates of invention.

In 1993 the institute was reincorporate as a joint-stock company and nowadays is one of the business units of the SITRONICS Microelectronics division. Today, the institute performs service maintenance of equipment at JSC Mikron and VSP-Mikron, namely:

  • · equipment upgrade, its re-equipping with modern functional systems, which ensures enhanced efficiency of the production;
  • · equipment service maintenance;
  • · development, manufacture and supply of equipment for well-known and new production processes in nanoelectronics, micromechanics, extreme electronics etc;

· development of working design documentation for equipment parts, assemblies and units in electronic form in compliance with the requirements of the effective standards, production process development as per Customer’s assignment.

The enterprise develops and manufactures experimental and testing industrial equipment for scientific research and technical training, as well as for ensuring preproduction and pilot production at small and medium enterprises.

The institute specializes in development and manufacture of vacuum plasma equipment for production processes of thin film application (magnetron deposition, thermal evaporation), plasma etch chemistry, plasma-enhanced chemical vapour deposition – PECVD, as well as physical and thermal equipment for processes of diffusion, oxidation, epitaxy and annealing, including fast thermal one.

The institute has a design department equipped with computer equipment and up-to-date software, which allows managing engineering data and document workflow, as well as keeping an electronic archive. An experimental and process area was commissioned for equipment assembly and testing in sterile conditions, as well as for production process try-out.



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